從2016年起，《化學(xué)氣相沉積》雜志將作為《先進(jìn)材料界面》雜志的一部分發(fā)表。請(qǐng)點(diǎn)擊這里獲取更多信息。化學(xué)氣相沉積(CVD)發(fā)表關(guān)于化學(xué)氣相沉積和相關(guān)技術(shù)的所有方面的評(píng)論、短通信和全文，以及其他介紹意見(jiàn)、新聞、會(huì)議信息和書評(píng)的文章。所有論文都經(jīng)過(guò)同行評(píng)審。該雜志為化學(xué)家、物理學(xué)家和工程師提供了一個(gè)統(tǒng)一的論壇，他們關(guān)于化學(xué)氣相沉積的出版物在過(guò)去已經(jīng)遍布于無(wú)機(jī)化學(xué)、材料化學(xué)、有機(jī)金屬學(xué)、應(yīng)用物理和半導(dǎo)體技術(shù)、薄膜和陶瓷加工的期刊上。

From 2016, the journal Chemical Vapor Deposition will be published as a section of the journal Advanced Materials Interfaces.Please click here for more information.Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews.All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.