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JOURNAL OF CRYSTAL GROWTH

來源: 樹人論文網 瀏覽次數:198次
創刊時間:1967
所屬分區:4區
周期:Biweekly
ISSN:0022-0248
影響因子:1.573
是否開源:No
年文章量:789
錄用比:容易
學科方向:晶體學
研究方向:物理
通訊地址:ELSEVIER SCIENCE BV, PO BOX 211, AMSTERDAM, NETHERLANDS, 1000 AE
官網地址:http://www.elsevier.com/wps/find/journaldescription.cws_home/505670/description#description
投稿地址:http://ees.elsevier.com/crys/
網友分享經驗:約2.6個月

JOURNAL OF CRYSTAL GROWTH雜志中文介紹

該雜志為從事晶體生長的實驗和理論方面的研究以及晶體生長在器件等方面的應用提供了一個共同的參考和出版來源。實驗和理論貢獻發表在以下領域:成核和生長理論、分子動力學和輸運現象、聚合物和玻璃等粘性介質中的結晶;金屬、礦物、半導體、超導體、磁性、無機、有機和生物物質的晶體生長或作為薄膜;分子束外延、化學氣相沉積、III-V、II-VI等半導體的生長;用物理和化學方法表征單晶;晶體生長的儀器、儀器和技術以及純化方法;多層異質結構及其表征,重點在晶體生長和外延方面的電子材料。該雜志的一個特色是定期收錄有關晶體生長相關方面的研討會和會議記錄。

JOURNAL OF CRYSTAL GROWTH雜志英文介紹

The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.

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