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Recent Patents on Nanotechnology

來源: 樹人論文網 瀏覽次數:244次
創刊時間:2007
ISSN:1872-2105
影響因子:1.75
是否開源:No
年文章量:23
錄用比:容易
研究方向:工程技術
官網地址:http://benthamscience.com/journal/index.php?journalID=rpnanotec
投稿地址:http://bsp-cms.eurekaselect.com/index.php/NANOTEC/login?source=%2Findex.php%2FNANOTEC
網友分享經驗:約3.0個月

Recent Patents on Nanotechnology雜志中文介紹

最近納米技術專利發表長篇/迷你評論和研究文章,反映或處理研究與專利,申請專利報道的研究中,討論的比較結果對于一個給定的應用專利,等等,還有客人編輯主題問題最近在納米技術領域的專利。該雜志還收錄了一些重要的和最新的納米技術專利。該雜志是所有涉及納米技術的研究人員的必讀書。

Recent Patents on Nanotechnology雜志英文介紹

Recent Patents on Nanotechnology publishes full-length/mini reviews and research articles that reflect or deal with studies in relation to a patent, application of reported patents in a study, discussion of comparison of results regarding application of a given patent, etc., and also guest edited thematic issues on recent patents in the field of nanotechnology. A selection of important and recent patents on nanotechnology is also included in the journal. The journal is essential reading for all researchers involved in nanotechnology.

Recent Patents on Nanotechnology影響因子

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